High-NA

This week ASML is making two very important announcements related to their progress with high numerical aperature extreme ultraviolet lithography (High-NA EUV). First up, the company's High-NA EUV prototype system at its fab in Veldhoven, the Netherlands, has printed the first 10nm patterns, which is a major milestone for ASML and their next-gen tools. Second, the company has also revealed that it's second High-NA EUV system is now out the door as well, and has been shipped to an unnamed customer. "Our High-NA EUV system in Veldhoven printed the first-ever 10 nanometer dense lines," a statement by ASML reads. "Imaging was done after optics, sensors and stages completed coarse calibration. Next up: bringing the system to full performance. And achieving the same results in the...

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29 by Ryan Smith on 2/21/2024

ASML to Ship Multiple High-NA Tools in 2025, Expands Production Capacities

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8 by Anton Shilov on 2/14/2024

ASML's First High-NA EUV Litho Scanner Arrives At Intel [UPDATED]

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28 by Anton Shilov on 1/5/2024

Intel High-NA Lithography Update: Dev Work On Intel 18A, Production On Future Node

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24 by Ryan Smith on 9/20/2023

ASML to Deliver First High-NA EUV Tool This Year

In a promising sign for the development of the next generation of EUV lithography machines, ASML has revealed that the company is set to deliver the industry's first High-NA...

7 by Anton Shilov on 9/6/2023

Samsung Seeks to Make South Korea No. 1 Chipmaker with $230B Investment Over 20 Years

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22 by Anton Shilov on 3/15/2023

ASML High-NA Development Update: Coming to Fabs in 2024 - 2025

It took the semiconductor industry over a decade to prep everything needed for production of chips using extreme ultraviolet (EUV) lithography. It looks like it is going to take...

8 by Anton Shilov on 5/26/2022

Intel Opens D1X-Mod3 Fab Expansion; Moves Up Intel 18A Manufacturing to H2’2024

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91 by Ryan Smith on 4/11/2022

EUV Wafers Processed and TwinScan Machine Uptime: A Quick Look

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29 by Dr. Ian Cutress on 12/11/2019

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